Organic Semiconductors: Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

1. Matthias E. Bahlke^1,*, 
2. Hiroshi A. Mendoza¹,
3. Daniel T. Ashall², 
4. Allen S. Yin¹, 
5. Marc A. Baldo¹

Article first published online: 29 NOV 2012

DOI: 10.1002/adma.201290293

Frozen carbon dioxide can be used as a phase-change resist to perform dry lithography of organic thin films, as shown by Matthias E. Bahlke and co-workerson page 6136. The resist sublimes closest to the surface, separating the still-solid resist that in turn lifts off undesired organic material. This new technique will help address the incompatibility of organic semiconductors with traditional photolithography.